Planar JSC
Laser-based mask defect repair systems


Laser-based mask defect repair systems 

The laser-based mask defect repair systems are intended to repair photomasks with transparent and opaque defects.

A contour-projection method is used to form an optical image for the repair of opaque defects.
Transparent defects are repaired through the laser-stimulated vapor deposition of metal-organic compounds.

Defects are detected automatically on the bases of the defect file formed at the inspection stage.

The model line of the laser-based mask defect repair systems, developed and manufactured by the company, is presented in the table as follows:


Production from 2009 6th generation: 90 nm technology node EМ-5131 Rmin=250 nm
Production from 2007 5th generation: LCD (900х600 mm repair area) EМ-5201 Rmin=500 nm
Production from 2001 4th generation: 350 nm technology node EМ-5001В Rmin=500 nm
Production from 1995 3th generation: 800 nm technology node EМ-5001AM Rmin=1.1 µm
Production from 1990 2rd generation: 1.0 µm technology node EМ-5001A Rmin=1.5 µm
Production from 1990 1nd generation: 1.5 µm technology node EМ-551B Rmin=2.0 µm


EМ-5231 Large-field laser-based mask defect repair system

EМ-5141 Laser-based mask defect repair system

EМ-5131 Laser-based mask defect repair system