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Laser-based mask defect repair systems


Laser-based mask defect repair systems 

The laser-based mask defect repair systems are intended to repair photomasks with transparent and opaque defects.

A contour-projection method is used to form an optical image for the repair of opaque defects.
Transparent defects are repaired through the laser-stimulated vapor deposition of metal-organic compounds.

Defects are detected automatically on the bases of the defect file formed at the inspection stage.

The model line of the laser-based mask defect repair systems, developed and manufactured by the company, is presented in the table as follows:


Production from 2009 6th generation: 90 nm technology node E-5131 Rmin=250 nm
Production from 2007 5th generation: LCD (900600 mm repair area) E-5201 Rmin=500 nm
Production from 2001 4th generation: 350 nm technology node E-5001 Rmin=500 nm
Production from 1995 3th generation: 800 nm technology node E-5001AM Rmin=1.1 m
Production from 1990 2rd generation: 1.0 m technology node E-5001A Rmin=1.5 m
Production from 1990 1nd generation: 1.5 m technology node E-551B Rmin=2.0 m


E-5131 Laser-based mask defect repair system

E-5001 Laser-based mask defect repair system