PLANAR (KBTEM)
 
Precision pattern generators

Pattern generators are considered to be the most complex devices in mask making. High requirements for such equipment are met only with the help of high-end technology.

Scanning laser generators represent a new generation of multichannel laser pattern generators for making masks, reticles and direct writing on wafers without any die size limitation. The pattern generator enables to make high precision features on the mask, to write phase shift masks and optical proximity masks. Pattern generation time depends on die size only and is irrespective of the layer pattern complexity.

 

Main features:
- Original reference pattern generation technique
- Electro-optic system to control laser radiation
- X-Y stage on magneto-air cushion with the use of linear step motor and laser interferometers

PLANAR has a big experience in the development of laser pattern generators. Presented herein is the model line of multichannel laser pattern generators for microelectronics built on the raster scan concept.


 


 


 



EM-5489
Multichannel solid state laser pattern generator

 


EM-5589
Multichannel laser pattern generator

 EM-5289B
Multichannel laser pattern generator
 


EM-5189-02
Multichannel laser pattern generator