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Precision pattern generators



Pattern generators are considered to be the most complex devices in mask making. High requirements for such equipment are met only with the help of high-end technology.

Scanning laser generators represent a new generation of multichannel laser pattern generators for making masks, reticles and direct writing on wafers without any die size limitation. The pattern generator enables to make high precision features on the mask, to write phase shift masks and optical proximity masks. Pattern generation time depends on die size only and is irrespective of the layer pattern complexity.


Main features:

  • Original reference pattern generation technique
  • Electro-optic system to control laser radiation
  • X-Y stage on magneto-air cushion with the use of linear step motor and laser interferometers



KBTEM-OMO has a big experience in the development of laser pattern generators.
Presented herein is the model line of multichannel laser pattern generators for microelectronics built on the raster scan concept.

Production from 2012 7th generation: 90 nm technology node E-5389 Rmin=200 nm
Production from 2008 6th generation: 180 nm technology node E-5289 Rmin=350 nm
Production from 2005 5th generation: 350 nm technology node E-5189 Rmin=600 nm
Production from 1999 4th generation: 500 nm technology node E-5089B Rmin=800 nm
Production from 1994 3rd generation: 1.0 m technology node E-5089A Rmin=1.0 m
Production from 1988 2nd generation: 1.5 m technology node E-5089 Rmin=1.5 m
Production from 1988 1st generation: 2.0 m technology node E-589B Rmin=2.0 m


E-5389 Multichannel laser pattern generator

E-5289 Multichannel laser pattern generator

E-5189-01 Multichannel laser pattern generator