Automatic mask inspection
Automatic mask inspection

Mask pattern inspection is of dominant significance in the semiconductor industry. Single microscopes as well as powerful optical systems are used for submicron structures.

PLANAR developed the model line of systems for the automatic inspection of reticle patterns.
Creation of the systems for the 45-60 nm technological node was a response to meet newest requirements of modern time.


If you require any further information, feel free to contact us:


Phone: +375 17 223 71 28,
+375 17 226 09 82
E-mail: This email address is being protected from spam bots, you need Javascript enabled to view it