PLANAR (KBTEM)
 
Automatic mask inspection
Automatic mask inspection

Mask pattern inspection is of dominant significance in the semiconductor industry. Single microscopes as well as powerful optical systems are used for submicron structures.

PLANAR developed the model line of systems for the automatic inspection of reticle patterns.
Creation of the systems for the 45-60 nm technological node was a response to meet newest requirements of modern time.


 


 



EМ-6929
Automatic mask inspection system

 


EM-6729B
EM-6729-0.25
Automatic mask inspection systems

 EМ-6015M1
System For Ultimate Express Inspection Of Pellicle-Covered Masks