Automatic mask inspection
Mask pattern inspection is of dominant significance in the semiconductor industry. Single microscopes as well as powerful optical systems are used for submicron structures.
KBTEM-OMO developed the model line of systems for the automatic inspection of reticle patterns.
Creation of the systems for the 45-60 nm technological node was a response to meet newest requirements of modern time.
|Production from 2009
||7th generation: 65-45 nm technology node
|Production from 2008
||6th generation: 110 nm technology node
|Production from 2006
||5th generation: 180 nm technology node
|Production from 2001
||4th generation: 350 nm technology node
|Production from 1995
||3rd generation: 800 nm technology node
|Production from 1991
||2nd generation: 1.0 µm technology node
|Production from 1987
||1st generation: 1.5 µm technology node