Automatic mask inspection
Automatic mask inspection

Mask pattern inspection is of dominant significance in the semiconductor industry. Single microscopes as well as powerful optical systems are used for submicron structures.

PLANAR developed the model line of systems for the automatic inspection of reticle patterns.
Creation of the systems for the 45-60 nm technological node was a response to meet newest requirements of modern time.



Automatic mask inspection system


Automatic mask inspection systems

System For Ultimate Express Inspection Of Pellicle-Covered Masks