EМ-5001В Laser-based mask defect repair system


EМ-5001В Laser-based mask defect repair system

The tool enables to repair masks with various coating types such as chromium, chromium oxide, and iron oxide.

Main features:

  • removal of opaque defects;
  • repair of transparent defects;
  • picosecond laser allows to perform damage-free processing of the mask substrate;
  • TV observation of defect finding, alignment and stage travel to the specified zone of a defect;
  • angular mask orientation and reference system binding;
  • process parameter setting in automatic and user modes.

Opaque defects are repaired through evaporation of residual chrome by a pulse laser.
Transparent defects are repaired by solid-state continuous laser through laser-enhanced deposition of metal-organic compounds.



Minimum diameter of defects under repair, µm:
- transparent  0.5
- opaque 0.5
Working field size, mm 160х160
Angular position of an area under repair, degrees,° 0...90
Accuracy of laser beam pointing at an opaque defect, nm 100
Opaque defect programmable size resolution, nm 100
Power consumption, not more than, kW 5