PLANAR (KBTEM)
 
EM-5784 Automatic alighment and exposure system

 EM-5784 Automatic alighment and exposure system

EM-5784 Automatic alighment and exposure system distinctive features:

  • Solid state laser as irradiation source;
  • Reticle placed on coordinate stage which can move along Y with high accuracy relative to the substrate;
  • Possible use of piezoelectric substrates for operation such as lithium niobate, lithium tantalate, piezoquartz, langacite, langate, etc.

 

SPECIFICATIONS

Reduction ratio1:5
Operating wavelength, nm354.7
Photolithographic resolution, um0.35
Work field size, mm3.2x3.2
Numerical aperture0.45-0.61
Wafer size, mm75,100,150
Reticle size, mm127x127