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EМ-5634 CCD stepper is designed to enable photolithography processes in the production of super large matrix and linear CCDs.
The main feature of EМ-5634 is a large working field of the projection lens (50x50 and 35x100) mm with high resolution of 1 µm.
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Wafer diameter, mm |
100,150 |
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Reticle size, mm |
152x152 (6"х6") |
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Photolithography resolution (L/S), µm |
1 |
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Depth of focus, µm |
6 |
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Working field, mm |
50x50,100x35 |
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Projection imaging scale |
1:1 |
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Automatic scale correction range, ppm |
±20 |
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Lens distortion, not more than, µm |
±0.3 |
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Wavelength, nm |
i-line 365.05 |
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Mercury lamp power, kW |
5 |
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Exposure irradiation power, mW/cm2 |
140 |
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Irradiation uniformity, % |
±3 |
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Exposure dose error, % |
±1.5 |
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Overlay accuracy (3σ), µm |
±0.2 |
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Power consumption, not more than, kW |
6.5 |
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