EM-5589 Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a raster scanning principle.

The EМ-5589 exposure system uses a continuous ultraviolet semiconductor laser with optical pumping at 355nm wavelength. Laser output power: 250 mW.
 MTBF is 20000 hours (~10 years). This laser model reduces the power consumption to 5 kW.


Minimum feature size, nm600
Exposure time of 100x100mm area, min70
Exposure field size, mm215x215
Overlay accuracy, nm70
Edge roughness, nm40
Address grid increment, nm1.25
Power consumption, not more than, kW5