PLANAR (KBTEM)
 
EM-5589 Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a raster scanning principle.

The EМ-5589 exposure system uses a continuous ultraviolet semiconductor laser with optical pumping at 355nm wavelength. Laser output power: 250 mW.
 MTBF is 20000 hours (~10 years). This laser model reduces the power consumption to 5 kW.


SPECIFICATIONS

Minimum feature size, nm600
Exposure time of 100x100mm area, min70
Exposure field size, mm215x215
Overlay accuracy, nm70
Edge roughness, nm40
Address grid increment, nm1.25
Power consumption, not more than, kW5