EM-5189-02 Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a raster scanning principle.

The EМ-5189-02 exposure system uses a continuous ultraviolet semiconductor laser with optical pumping at 355nm wavelength. Laser output power: 250 mW.
Model: Coherent Genesis CX 355-250 STM. MTBF is 20000 hours (~10 years). This laser model reduces the power consumption to 5 kW.

Minimum feature size, nm 600
Exposure time of 100x100 mm area, min 60
Exposure field size, mm 215x215
Overlay accuracy, nm 70
Edge roughness, nm 40
Address grid increment, nm 1.25