|
EM-5489B Multichannel laser pattern generator |
|
Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a 32-channel raster scanning principle.
The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.
| Minimum feature size, nm | 350 | | Exposure time of 100x100mm area, min | 120 | | Exposure field size, mm | 215x215 | | Overlay accuracy, nm | 50 | | Edge roughness, nm | 30 | | Address grid increment, nm | 1.25 | | Power consumption, not more than, kW | 55 |
|
|
PLANAR (KBTEM)