EM-5289B Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a raster scanning principle.

Minimum feature size, nm 350
Exposure time of 100x100 mm area, min 120
Exposure field size, mm 215x215
Overlay accuracy, nm 60
Edge roughness, nm 30
Address grid increment, nm 1.25