EM-5489 Multichannel solid state laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a 32-channel raster scanning principle.

The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.
Laser model: Coherent Innova Sabre MotoFred.


Minimum feature size, nm350
Exposure time of 100x100mm area, min120
Exposure field size, mm215x215
Overlay accuracy, nm50
Edge roughness, nm30
Address grid increment, nm1.25
Power consumption, not more than, kW55