EM-5489B Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates with simultaneous previous layers alignment (maskless optical lithography). The patterning is based on a 32-channel raster scanning principle.

The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.


Minimum feature size, nm350
Exposure time of 100x100mm area, min120
Exposure field size, mm215x215
Overlay accuracy, nm50
Edge roughness, nm30
Address grid increment, nm1.25
Power consumption, not more than, kW55