«KBTEM-OMO»
JOINT STOCK COMPANY
 
EM-5289B Multichannel laser pattern generator

Pattern generators provide possibility for pattern writing on semiconductor substrates
with simultaneous previous layers alignment (maskless optical lithography).
The patterning is based on a 32-channel raster scanning principle.

The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.
Laser model: Coherent Innova Sabre MotoFred.

 

Minimum feature size, nm 350
Exposure time of 100x100mm area, min 120
Exposure field size, mm 215x215
Overlay accuracy, nm 50
Edge roughness, nm 30
Address grid increment, nm 1.25
Power consumption, not more than, kW 55

 

 

 
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Shanghai New International
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Shanghai, China
March 20-22, 2019
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