«KBTEM-OMO»
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LIST OF ARTICLES OF KBTEM-OMO EMPLOYEES


 

Name 

Publishing house, magazine (name, №, year)

Author's name, co-author 

 

A prospective modular platform of the mask pattern automatic inspection using the die-to-database method (Proceedings Paper)

 

Proceedings Vol. 5853

Photomask and Next-Generation Lithography Mask Technology XII, Masanori Komuro, Editors, pp.965-976

Date: 28 June 2005

Syarhei Avakaw, Aliaksandr Korneliuk, Alena Tsitko 

 

 

 

High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform (Proceedings Paper)

Proceedings Vol. 5835

21st European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, pp.290-299

Date: 16 June 2005

Syarhei Avakaw 

 

 

 

A complete set of the special process equipment for the defect-free production of reticles (Proceedings Paper)

Proceedings Vol. 6533

23rd European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, 65331B

Date: 3 May 2007

Syarhei Avakaw; Valerian Iouditski; Leanid Pushkin; Alena Tsitko 

 

 

 

A technique to determine a capability to detect adjacent defects during an automatic inspection of reticle patterns (Proceedings Paper)

Proceedings Vol. 6283

Photomask and Next-Generation Lithography Mask Technology XIII, Morihisa Hoga, Editors, 628328

Date: 20 May 2006

Syarhei Avakaw; Aliaksandr Korneliuk; Alena Tsitko 

 

 

 

A technique to determine a capability to detect adjacent defects during the die-to-database inspection of reticle patterns (Proceedings Paper)

Proceedings Vol. 6281

22nd European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, 62810W

Date: 21 June 2006

Syarhei Avakaw; Aliaksandr Korneliuk; Alena Tsitko 

 

 

 

Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects (Proceedings Paper)

Proceedings Vol. 5148

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, Uwe F. W. Behringer, Editors, pp.119-127

Date: 28 May 2003

Syarhey M. Avakaw 

 

 

 

Semi-transparent isolated defect detection by die-to-database mask inspection using virtual scanning algorithms for sub-pixel resolution (Proceedings Paper)

Proceedings Vol. 5504

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, Uwe F. W. Behringer, Editors, pp.26-35

Date: 2 June 2004

Syarhey M. Avakaw