«KBTEM-OMO»
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LIST OF ARTICLES OF KBTEM-OMO EMPLOYEES

 

Name Publishing house, magazine (name, №, year) Author's name, co-author Annotation
The Impact of ESD on Microcontrollers Minsk, Kolorgrad, 2018, 184 p. G.A.Piskun V.F.Alexeev S.M.Avakov V.E.Matyushkov D.S.Titko
Double Side Lithography: Solution for Heat Dissipation and Interconnection Layout Issues Electronics: Science, Technology, Business No 4, 2015
p.58-62
V.I.Plebanovich As IC integration scale grows, two issues emerge. The first issue: the whole interconnection area grows. The second issue: the bigger the number of elements is, the more complicated heat dissipation from active circuit areas becomes. Double side lithography is the problem solution
Automatic Micro Defect Inspection on Semiconductor Wafers Electronics: Science, Technology, Business No 5, 2015,
p.132-140
V.I.Plebanovich Transfer to submicron technologies results in exponential defect growth. Visual inspection of defects of such a small size in visible light under the microscope is impossible. EM-6429 Automatic Patterned Wafer Micro Defect Inspection Tool is a solution to many problems resulting from IC fabrication of submicron size
Mask-free Lithography is Today’s Requirement Electronics: Science, Technology, Business No 7, 2015,
p.112-118
V.I.Plebanovich For small production volume, the cost of a set of masks can be a few times more expensive than die fabrication. Mask fabrication process can only be eliminated by mask-free lithography
Autofocus in the systems of automatic mask and wafer pattern inspection Electronica, Russian Federation.– 2015. – №5. – p.125 – 128 S.M.Avakow A.V.Bezludov N.I.Gaikov V.L.Lanin V.P.Oher D.S.Titko G.A.Trapashko In order to increase accuracy of automatic mask and wafer pattern inspection an autofocus system is offered which ensures keeping the plane in objective focus zone during the sequential scanning of the pattern
A prospective modular platform of the mask pattern automatic inspection using the die-to-database method (Proceedings Paper) Proceedings Vol. 5853

 

Photomask and Next-Generation Lithography Mask Technology XII, Masanori Komuro, Editors, pp.965-976

 

Date: 28 June 2005
Syarhei Avakaw Aliaksandr Korneliuk Alena Tsitko
High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform (Proceedings Paper) Proceedings Vol. 5835

 

21st European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, pp.290-299

 

Date: 16 June 2005
Syarhei Avakaw
A complete set of the special process equipment for the defect-free production of reticles (Proceedings Paper) Proceedings Vol. 6533

 

23rd European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, 65331B

 

Date: 3 May 2007
Syarhei Avakaw Valerian Iouditski Leanid Pushkin Alena Tsitko
A technique to determine a capability to detect adjacent defects during an automatic inspection of reticle patterns (Proceedings Paper) Proceedings Vol. 6283

 

Photomask and Next-Generation Lithography Mask Technology XIII, Morihisa Hoga, Editors, 628328

 

Date: 20 May 2006
Syarhei Avakaw Aliaksandr Korneliuk Alena Tsitko
A technique to determine a capability to detect adjacent defects during the die-to-database inspection of reticle patterns (Proceedings Paper) Proceedings Vol. 6281

 

22nd European Mask and Lithography Conference, Uwe F. W. Behringer, Editors, 62810W

 

Date: 21 June 2006
Syarhei Avakaw Aliaksandr Korneliuk Alena Tsitko
Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects (Proceedings Paper) Proceedings Vol. 5148

 

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, Uwe F. W. Behringer, Editors, pp.119-127

 

Date: 28 May 2003
Syarhey Avakaw
Semi-transparent isolated defect detection by die-to-database mask inspection using virtual scanning algorithms for sub-pixel resolution (Proceedings Paper) Proceedings Vol. 5504

 

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, Uwe F. W. Behringer, Editors, pp.26-35

 

Date: 2 June 2004
Syarhey Avakaw