|
Products manufactured by photolithography: precise photomasks, reference grids and sighting scales, test-objects, test patterns, radial limbs and code disks, analyzing masks and diaphragms, standard glass divided scales and raster linear scales.
Photomasks used for manufacture of ICs, MEMS and HICs, as well as to test and certify tolerances of the optomechanical and inspection machines.
|
Substrate material |
optical glass, quartz, glass ceramics |
|
Substrate size |
up to 305x305 mm, 1.0 to
6.4 mm
thickness |
|
Layout pattern |
arbitrary |
|
Registration error in the field |
280х280 mm - ±1 µm
140х140 mm - ±0.5 µm |
|
Minimum feature in the field |
100х100 mm – 1 µm
200х200 mm – 2.0 µm |
|
Certification accuracy |
in 140х140mm field – 0.16 µm |
Reference grids and sighting scales, test-objects for optical devices and microscopes.
|
Substrate material |
optical glass, quartz |
|
Coating |
chrome or antireflective for specified wavelength |
|
Pattern |
arbitrary |
|
Minimum feature |
1.0 µm |
|
Certification accuracy |
0.16 µm |
Standard linear, radial and special test patterns
Used to evaluate resolution and depth of focus of the process equipment optical systems, optical device objective lenses, photographic objectives and materials, photographic and photolithographic processes.
|
Image |
bright / dark field |
|
Layout pattern |
arbitrary |
|
Minimum feature |
1.0 µm |
|
Working field |
up to 140х140 mm |
Radial limbs and code disks (raster), analyzing masks and diaphragms
Application: angle encoders in the NC machines, process and inspection systems.
|
Substrate material |
optical glass |
|
Coating |
chrome or antireflective for specified wavelength |
|
Diameter of optical parts |
6-
280 mm |
|
Number of scale marks (in 100mm diameter) |
6000 |
Standard glass divided scales and raster linear scales
Application: certification of the optomechanical, inspection and measurement, and process systems, as well as other tools and devices; used in linear displacement transducers of the NC machines and other types of process equipment.
|
Substrate material |
optical glass, quartz, glass ceramics |
|
Coating |
chrome or antireflective for specified wavelength |
|
Scale length |
up to
300 mm
(one-axis) or
260х260mm field (two-axis) |
|
Minimum scale line width |
2 µm |
|
Minimum scale line width at length of up to
100 mm
|
1 µm |
|
PLANAR (KBTEM)