«KBTEM-OMO»
JOINT STOCK COMPANY
 
Manufacturing of photo masks

Products manufactured by photolithography: precise photomasks, reference grids and sighting scales, test-objects, миры, test patterns, radial limbs and code disks, analyzing masks and diaphragms, standard glass divided scales and raster linear scales.

Photomasks used for manufacture of ICs, MEMS and HICs, as well as to test and certify tolerances of the optomechanical and inspection machines.

 

Substrate material

optical glass, quartz, glass ceramics

Substrate size

up to 305x305 mm, 1.0 to 6.4 mm thickness

Layout pattern

arbitrary

Registration error in the field

280х280 mm - ±1 µm
140х140
mm - ±0.5 µm

Minimum feature in the field

100х100 mm – 1 µm
200х200
mm – 2.0 µm

Certification accuracy

in 140х140mm field – 0.16 µm

 

Reference grids and sighting scales, test-objects for optical devices and microscopes.

 

Substrate material

optical glass, quartz

Coating

chrome or antireflective for specified wavelength

Pattern

arbitrary

Minimum feature

1.0 µm

Certification accuracy

0.16 µm

 

Standard linear, radial and special test patterns

Used to evaluate resolution and depth of focus of the process equipment optical systems, optical device objective lenses, photographic objectives and materials, photographic and photolithographic processes.

Image

bright / dark field

Layout pattern 

arbitrary

Minimum feature

1.0 µm

Working field

up to 140х140 mm

 

Radial limbs and code disks (raster), analyzing masks and diaphragms  

Application: angle encoders in the NC machines, process and inspection systems.

 

Substrate material

optical glass

Coating

chrome or antireflective for specified wavelength

Diameter of optical parts

6- 280 mm

Number of scale marks (in 100mm diameter)

6000

 

Standard glass divided scales and raster linear scales  

Application: certification of the optomechanical, inspection and measurement, and process systems, as well as other tools and devices; used in linear displacement transducers of the NC machines and other types of process equipment.

 

Substrate material

optical glass, quartz, glass ceramics

Coating

chrome or antireflective for specified wavelength

Scale length

up to 300 mm (one-axis) or
260
х260mm field (two-axis)

Minimum scale line width

2 µm

Minimum scale line width at length of up to 100 mm

1 µm