|
Mirrors (broadband, dielectric, laser and others)
Brodband dielectric mirrors
|
Material |
BK-7, fine annealed optical glass |
|
|
Diameter Tolerance |
12.7-
101.6 mm
(0.5-
4.0 in
.) |
+0/-0.13mm |
|
|
152.4 -
203.2 mm
(6.0 -
8.0 in
.) |
+0/-
0.25 mm
|
|
Center Thickness Tolerance (Tc) |
12.7-
101.6 mm
(0.5-
4.0 in
.) |
±
0.25 mm
|
|
|
152.4 -
203.2 mm
(6.0 -
8.0 in
.) |
±
0.38 mm
|
|
Clear Aperture |
> central 80% of diameter |
|
|
Chamfers |
12.7 -
25.4 mm
(0.5 -
1.0 in
.) |
0.25-
0.76 mm
face width x45°± 15° |
|
|
30-
101.6 mm
(1.181-
4.0 in
.) |
0.38-
1.14 mm
face width x45°±15° |
|
|
152.4 -
203.2 mm
(6.0 -
8.0 in
.) |
0.51-
1.52 mm
face width x45°± 15° |
|
S2 Surface |
Ground |
|
|
Cleaning |
Non-abrasive method, acetone or isopropyl
alcohol on lens tissue are recommended |
|
|
Damage Threshold |
1000 W/cm2 CW, 10 mJ/cm2 with 10 nsec
pulses within the wavelength range |
|
|
Wavelength Range (nm) |
Reflectivity (average) |
Angle of Incidence |
|
488—694 |
Rs, Rp >99% |
0-45° |
|
700-950 |
Rs>99%,Rp>98% |
0-45° |
|
632.8 |
Ravg >80% |
0-45° |
High Energy Excimer Laser Mirrors
|
Material |
UV grade fused silica |
|
S1 Surface Accuracy |
λ/10 at 632.8 nm over clear aperture |
|
S2 Surface Flatness |
λ /10 at 632.8 nm over clear aperture |
|
Clear Aperture |
> central 80% of diameter |
|
Surface Quality |
40 - 20 scratch-dig |
|
Diameter Tolerance |
+0/-
0.25 mm
|
|
Thickness Tolerance |
±
0.5 mm
|
|
Wedge |
> 3 arc min |
|
Chamfer |
25.4 mm
diameter: 0.25—0.76 mm face width x45±15º |
|
|
50.8 mm
diameter: 0.38—1.14 mm face width x45±15º |
|
Cleaning |
Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended |
|
Damage Threshold |
1 MW/ cm2 CW, 1 wavelength J/cm2 with 10 nsec pulses at the center |
|
Laser Type |
Central Wavelength (nm) |
Angle of Incidence |
Reflectivity |
|
ArF |
193 |
0° |
Runpol>98% |
|
KrF |
248 |
0° |
Rs, Rp>99% |
|
XeCl |
308 |
0° |
Rs, Rp>99% |
|
XeF |
351-353 |
0° |
Rs, Rp>99% |
|
ArF |
193 |
45° |
Runpol>95% |
|
KrF |
248 |
45° |
Rs, Rp>99% |
|
XeCl |
308 |
45° |
Rs, Rp>99% |
|
XeF |
351-353 |
45° |
Rs, Rp>99% |
High
Energy
ND
:Yag Laser Mirrirs
|
Material |
UV grade fused silica |
|
Surface Flatness S1 |
λ /10 at 632.8 nm over clear aperture |
|
Surface Flatness S2 |
λ /10 at 632.8 nm over clear aperture |
|
Clear Aperture |
>= central 80% of diameter |
|
Surface Quality |
40 - 20 scratch-dig |
|
Diameter Tolerance |
+0/-
0.25 mm
|
|
Thickness Tolerance |
±
0.5 mm
|
|
Wedge |
<= 3 arc min |
|
Chamfer |
25.4 mm
diameter: 0.25-
0.76 mm
face width x45±15° |
|
|
50.8 mm
diameter: 0.38-
1.14 mm
face width x45±15° |
|
Cleaning |
Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended |
|
Damage Threshold |
1064 nm: 5 MW/cm2 CW, 5 J/cm2 with 0.1-100 nsec pulses |
|
|
532 nm: 2.5 MW/cm2 CW, 2.5 J/cm2 with 0.1-100 nsec pulses |
|
|
354.7 nm: 1 MW/cm2 CW, 1 J/cm2 with 0.1-100 nsec pulses |
|
|
266 nm: 1 MW/cm2 CW, 1 J/cm2 with 0.1-100 nsec pulses |
|
Laser Type |
Wavelength (mm) |
Angle of Incidence |
Reflectivity |
|
Nd:YAG (1) |
1064 |
0° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (2) |
532 |
0° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (3) |
354.7 |
0° |
Rs>99.7°/o,Rp>99% |
|
Nd:YAG (4) |
266 |
0° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (1) |
1064 |
45° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (2) |
532 |
45° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (3) |
354.7 |
45° |
Rs>99.7%,Rp>99% |
|
Nd:YAG (4) |
266 |
45° |
Rs>99.7%,Rp>99% |
Laser Broadband 45° Mirrors
|
Material |
BK-7, grade A, precision annealed optical glass |
|
Surface Flatness |
λ /10 at 632.8 nm over clear aperture |
|
Clear Aperture |
>= central 80% of diameter |
|
Surface Quality |
40 - 20 scratch-dig |
|
Diameter Tolerance |
+0/-
0.25 mm
|
|
Edge Thickness Tolerance (Te) |
±
0.38 mm
|
|
Wedge |
30±15arc min |
|
Chamfer |
0.5±
0.25 mm
face width x45± 15° |
|
Angle of Incidence |
0-10° |
|
S1 Coating |
Rs>99%, 700-930 nm, Rp>99%, 730-870 nm |
|
S2 Coating |
None |
|
Cleaning |
Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended |
Laser High Reflecting Pump Mirrors
|
Material |
BK-7, fine annealed optical glass |
|
S1 Surface Accuracy |
Plano
, λ /10 flatness at 632.8 nm over the clear aperture Concave,
λ /5 irregularity at 632.8 nm over the clear aperture |
|
S2 Surface Flatness |
Concave, λ /10 at 632.8 nm over clear aperture |
|
Clear Aperture |
>= central 80% of diameter |
|
Surface Quality |
40 - 20 scratch-dig |
|
Diameter Tolerance |
+0/-
0.25 mm
|
|
Edge Thickness Tolerance (Te ) |
±
0.25 mm
|
|
Wedge |
Flat mirror, 30±15 arc. min |
|
Chamfer |
0.5±
0.25 mm
face width x45± 15° |
|
Angle of Incidence |
0-15° |
|
S1 Coating |
Rs,Rp>99%, 710-890 nm, Ts, Tp>95%, 488-532 nm, 0-20° AOI |
|
S2 Coating |
Broadband, multilayer antireflection coating, Ravg <0.5%,430-700 nm, 0-15° AOI |
|
Cleaning |
Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended |
Laser Line Dielectric Mirrors
|
Diameter Tolerance |
12.7-
101.6 mm
(0.5-
4.0 in
.) |
+0/-0.13mm |
|
|
152.4
8.0 in
.) x
203.2 mm
(6.0 x |
+0/-0.25mm |
|
Center Thickness Tolerance (Tc) |
12.7-
101.6 mm
(0.5-
4.0 in
.)
|
±
0.25 mm
|
|
|
152.4
203.2 mm
(6.0 x
8.0 in
.) x |
±
0.38 mm
|
|
Clear Aperture |
> central 80% of diameter |
|
|
Chamfers |
12.7
25.4 mm
(0.5 x
0.1 in
.) x |
0.25-
0.76 mm
face width x45°± 15° |
|
|
30-
101.6 mm
(1.181-
4.0 in
.) |
0.38-
1.14 mm
face width x45°± 15° |
|
|
152.4 x
203.2 mm
(6.0 x
8.0 in
.) |
0.51-
1.52 mm
face width x45°± 15° |
|
S2 Surface |
Ground |
|
|
Cleaning |
Non-abrasive method, acetone or isopropyl alcohol
on lens tissue are recomended |
|
|
Damage Threshold |
WL=325 nm, 500 W/cm2 CW, 0.25 J/cm2
with 10 nsec pulses at 325nm |
|
|
|
WL=1064 nm, 1000 W/cm2 CW, 10 J/cm2 with 10 nsec
pulses within the wavelength range |
|
|
|
All others, 1000 W/cm2 CW, 0.5 J/cm2 with
10 nsec pulses within the wavelength range |
|
|
Laser Type |
Central Wavelenght (nm) |
Wavelength Range (nm) |
Reflectivity |
Angle of Incidence |
|
HeCd |
325 |
325 |
Rs,Rp>99% |
0-45° |
|
HeCd |
441.6 |
441.6 |
Rs,Rp>99% |
0-45° |
|
Argon-Iron |
488—514.5 |
488—514.5 |
Rs,Rp>99% |
0-45° |
|
HeNe |
632.8 |
632.8 |
Rs,Rp>99% |
0-45° |
|
Nd:YAG |
1064 |
1030-1090 |
Rs,Rp>99% |
0-45° |
|
Diode |
1300 |
1290-1350 |
Rs,Rp>99% |
0-45° |
|
Diode |
1550 |
1520—1580 |
Rs,Rp>99% |
0-45° | |
PLANAR (KBTEM)