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Parts made by photolithography method (precision masks and reticles, measuring grids, sighting scales, test objects, radial limbs, code disks, analyzing masks and diaphragms, glass linear standards and linear raster scales)
Precision masks for manufacture of HIC and VLSI, for testing and certification of accuracy of opto-mechanical, inspection and measurement equipment
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Substrate material |
Optical glass, quartz, glass ceramics |
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Substrate size |
up to 305x305 mm |
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Pattern |
Arbitrary |
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Positioning accuracy of features on a field |
280х280 mm - ±1 μm
140х140 mm - ±0.5 μm |
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Minimum feature on a field |
100х100 mm – 1 μm
200х200 mm – 1.5 μm |
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Certification accuracy |
on a field 140х140 mm – 0.16 μm |
Measuring grids, sighting scales, test objects for optical instruments and microscopes
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Substrate material |
Optical glass, quartz, glass ceramics |
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Coating |
Chrome or antireflective for required wavelength |
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Pattern |
Arbitrary |
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Minimum feature |
0.7 μm |
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Certification accuracy |
0.16 μm |
Standard linear, radial and special test objects
Used for verification of resolution, depth of focus of process equipment optical systems, of optical instruments’ lenses, photographic lenses and materials, photographic and photolithography processes.
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Image |
Bright and dark field |
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Pattern |
Arbitrary |
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Minimum feature |
0.7 μm |
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Working field |
Up to 140х140 mm |
Radial limbs and code (raster) disks, analyzing masks and diaphragms
Application: angle encoders for CNC machine tools, process, inspection and measurement equipment.
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Substrate material |
Optical glass |
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Coating |
Chrome or antireflective for required wavelength |
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Diameter of optical parts |
6-280 mm |
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Line increment |
6" |
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For code limbs |
Up to 13 orders |
Glass linear standards and raster linear scales
Application: to certify opto-mechanical, inspection and measurement, special process and other types of equipment and instruments, also used are in linear encoders of CNC tools, etc.
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Substrate material |
Optical glass, quartz, glass ceramics
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Coating
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Chrome or antireflective for required wavelength |
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Scale length |
Up to 630 mm – single-coordinate or
field 260х260 mm – double-coordinate |
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Minimum line width |
2 μm |
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Raster scale pitch |
4 μm and more | |
PLANAR (KBTEM)