PLANAR (KBTEM)
 
WAFER INSPECTION EQUIPMENT

The equipment enabling inspection processes is characterized by a large diversity and essentially differs in the degree of complexity: from simple visual inspection tools for mass production to the most complex automatic inspection and measurement systems which are used both in the R& D of new technologies and devices, as well as in the large-scale production.


 


 



EМ-6022
Automatic spectral ellipsometry system

 


EМ-6419
Wafer flatness inspection system

 


EМ-6429
Automatic patterned wafer micro defect inspection system

 


 


 



EМ-6129
Automatic unpatterned wafer defect inspection system

 


EМ-6015M1
System for ultimate express inspection of pellicle-covered masks

 


EМ-6439
Submicron Size Inspection System