«KBTEM-OMO»
JOINT STOCK COMPANY
 
EМ-6479 Automatic unpatterned wafer defect inspection system

 

EМ-6479 Automatic unpatterned wafer defect inspection system

EМ-6479 is designed to inspect unpatterned wafers for surface сontamination.

The system allows both to perform final inspection at wafer fabs and the incoming inspection in the production of chips.

 

Specifications 

Minimum detected defect size, nm 150
Minimum defect size detection probability 0.95
Throughput, wafers per hour 80
Wafer diameter, nm 100, 150, 200
Power consumption, not more than, kW 700