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EQUIPMENT FOR DIRECT WRITING ON WAFERS |
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Pattern generators are considered to be complex tools in manufacturing of semiconductor devices. High requirements to such equipment can be met only with the help of high-end technology.
PLANAR has extensive experience in the development of opto-mechanical equipment. The model line of multichannel laser pattern generators for microelectronics built on the raster scan concept is characterized by exceptional functional features:
- direct writing on wafers (maskless optical lithography);
- overlay option;
- high throughput;
- process switch to mask writing mode.
The universality of such high-performance equipment makes it indispensable for scientific institutions and microelectronics manufacturers.
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PLANAR (KBTEM)
