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EМ-5634 CCD stepper is designed to enable photolithography processes in the production of super large matrix and linear CCDs.
The main feature of EМ-5634 is a large working field of the projection lens (50x50 and 35x100) mm with high resolution of 1 µm.
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Wafer diameter, mm | 100,150 | |
Reticle size, mm | 152x152 (6"х6") | |
Photolithography resolution (L/S), µm | 1 | |
Depth of focus, µm | 6 | |
Working field, mm | 50x50,100x35 | |
Projection imaging scale | 1:1 | |
Automatic scale correction range, ppm | ±20 | |
Lens distortion, not more than, µm | ±0.3 | |
Wavelength, nm |
i-line 365.05 | |
Mercury lamp power, kW | 5 | |
Exposure irradiation power, mW/cm2 | 140 | |
Irradiation uniformity, % | ±3 | |
Exposure dose error, % | ±1.5 | |
Overlay accuracy (3σ), µm | ±0.2 | |
Power consumption, not more than, kW | 6.5 |
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PLANAR (KBTEM)