Planar JSC
EМ-5189-02 Multichannel laser pattern generator

The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices. EM-5189-02 enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 16-channel raster scanning principle.
The exposure system features a continuous 355 nm optical pump UV semiconductor laser system.
MTBF is 20000 hours (~10 years).
Laser output power: 250mW.
Laser model: Coherent Genesis CX355-250 STM.

Minimum feature size, nm 600
Exposure time of 100x100mm area, min 70
Exposure field size, mm 215x215
Overlay accuracy, nm 70
Edge roughness, nm 40
Address grid increment, nm 1.25
Power consumption, not more than, kW 5