EM-5079-1 UV pattern generator

The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices. EM-5079-1 enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 16-channel raster scanning principle.
The exposure system uses a continuous 355 nm solid state laser system.
MTBF is 20000 hours (~10 years).
Laser output power: 250mW.


Minimum feature size, nm600
Exposure time of 100x100mm area, min70
Exposure field size, mm215x215
Overlay accuracy, nm70
Edge roughness, nm40
Address grid increment, nm1.25
Power consumption, not more than, kW5