«KBTEM-OMO»
JOINT STOCK COMPANY
 
EМ-5289B Multichannel laser pattern generator

 

EM-5289B Multichannel laser pattern generator 

The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices.

EM-5289B enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 32-channel raster scanning principle. The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.
Laser model: Coherent Innova Sabre MotoFred.

 

Specifications 

Minimum feature size, nm 350
Exposure time of 100x100mm area, min 120
Exposure field size, mm 215x215
Overlay accuracy, nm 50
Edge roughness, nm 30
Address grid increment, nm 1.25
Power consumption, not more than, kW 55

 

The detailed information is available for registered customers only