Planar JSC
EМ-5289B Multichannel laser pattern generator


ЭМ-5289Б Генератор сканирующий лазерный 

The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices.

EM-5289B enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 32-channel raster scanning principle. The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.
Laser model: Coherent Innova Sabre MotoFred.



Minimum feature size, nm 350
Exposure time of 100x100mm area, min 120
Exposure field size, mm 215x215
Overlay accuracy, nm 50
Edge roughness, nm 30
Address grid increment, nm 1.25
Power consumption, not more than, kW 55