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EM-5489B Multichannel laser pattern generator |
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The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices. EM-5489B enables to generate patterns on substrates with the patterns aligned with previous layers.
The patterning is based on a 32-channel raster
scanning principle. The exposure system features a continuous 257.2 nm
UV Ar laser system.
Laser output power: 1000mW.
| Minimum feature size, nm | 350 | | Exposure time of 100x100mm area, min | 120 | | Exposure field size, mm | 215x215 | | Overlay accuracy, nm | 50 | | Edge roughness, nm | 30 | | Address grid increment, nm | 1.25 | | Power consumption, not more than, kW | 55 |
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PLANAR (KBTEM)