PLANAR (KBTEM)
 
EM-5489 Multichannel solid state laser pattern generator

 

The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices. EM-5489 enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 32-channel raster scanning principle. The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.

 
SPECIFICATIONS

Minimum feature size, nm350
Exposure time of 100x100mm area, min120
Exposure field size, mm215x215
Overlay accuracy, nm50
Edge roughness, nm30
Address grid increment, nm1.25
Power consumption, not more than, kW55