EM-5489B Multichannel laser pattern generator


The generator is designed to make metallized photomasks used in the production of LSIs, VLSIs and other electronic devices. EM-5489B enables to generate patterns on substrates with the patterns aligned with previous layers.

The patterning is based on a 32-channel raster scanning principle. The exposure system features a continuous 257.2 nm UV Ar laser system.
Laser output power: 1000mW.


Minimum feature size, nm350
Exposure time of 100x100mm area, min120
Exposure field size, mm215x215
Overlay accuracy, nm50
Edge roughness, nm30
Address grid increment, nm1.25
Power consumption, not more than, kW55