«KBTEM-OMO»
JOINT STOCK COMPANY
 
EM-6329B and EM-6329R Automatic mask inspection systems

 

EM-6329B and EM-6329R Automatic mask inspection systems

EM-6329B and EM-6329R systems are designed for automatic inspection of reticles and work photomasks having transparent and opaque defects: pindots, pinholes, protrusions, mouse bites, shorts between features, breaks, corner roundings, size shifts, half-tone defects, etc.

The automatic defect inspection is realized through a die-to-database comparison method. After completion of inspection cycle, the defect list is formed and the operator can observe the defects on the display screen.

 

Specifications 

  EM-6329B EM-6329R
Minimum detected defect size, µm 0.15 0.25
Inspection time of 100x100mm area, min 25
Inspection time of 100x100mm area with doubled pixel(0.5µm), min 7
Working field size, mm 153х153
X-Y stage resolution, nm 5
Visual channel magnification factor 150, 600, 2000
Reference image feature size correction range, nm 50 ... 250
Defect programmed filtering range, µm 0.25 ... 2.5
Pellicle frame maximum height (at each side of a mask), mm 8
Data formats ZBA, GDS, DXF, EM-5x09, EM-5x89
Power consumption, not more than, kW 1.8