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EM-6729B Automatic mask inspection system |
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EM-6729B system is designed for
automatic inspection of patterns of the photomasks having transparent
and opaque defects.
Automatic defect inspection is enabled by comparison of the mask pattern obtained in transmitted light to the reference pattern produced by the pattern database, followed by defect list generation upon automatic inspection completion. Defect displaying to the operator is available.
SPECIFICATIONS
| | EM-6729B |
| Minimum detected defect size, µm | 0.15 |
| Inspection time of 100x100mm area, min | 40 |
| Inspection time of 100x100mm area with doubled pixel, min | 25 |
| Maximum working field size, mm | 153х153 |
| Defect programmed filtering range, µm | 0.15 ... 1.5 |
| Pellicle frame maximum height, mm | 6,5 |
| Data formats | GDSII, MEBES, DXF |
| Power consumption, not more than, kW | 2 |
| Defect presentation in off- and online modes upon inspection completion is available. |
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PLANAR (KBTEM)
