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EM-6729B and EM-6729-0.25 systems are designed for
automatic inspection of reticles and work photomasks having transparent
and opaque defects: pindots, pinholes, protrusions, mouse bites, shorts
between features, breaks, corner roundings, size shifts, half-tone
defects, etc.
The automatic defect inspection is realized through a
die-to-database comparison method. After completion of inspection
cycle, the defect list is formed and the operator can observe the
defects on the display screen.
SPECIFICATIONS
| | EM-6729B | EM-6729-0.25 | | Minimum detected defect size, µm | 0.15 | 0.25 | | Inspection time of 100x100mm area, min | 30 | 25 | | Inspection time of 100x100mm area with doubled pixel, min | 18 | 15 | | Working field size, mm | 153х153 | | X-Y stage resolution, nm | 5 | | Visual channel magnification factor | 150, 600, 2000 | | Reference image feature size correction range, nm | 50 ... 250 | | Defect programmed filtering range, µm | 0.15 ... 1.5 | | Pellicle frame maximum height (at each side of a mask), mm | 6,5 | | Data formats | ZBA, GDS, MEBES, DXF, other formats are optional | | Power consumption, not more than, kW | 1.8 |
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PLANAR (KBTEM)
