Planar JSC
EM-5009М Laser pattern generator


EM-5009М Laser pattern generator

The EM-5009M generator is designed to generate patterns on emulsion photomasks in the production of ICs, semiconductor devices, HICs, LCDs, R&D purposes. A microphotosetting technique is used to form a pattern.

The generator exposure system uses an illuminator based on two flash lamps.



Aperture size range, µm 4 ... 1500
Throughput (for regular structures), mln. exposures/hr 0.2
Exposure field size, mm 153x153
X-Y stage resolution, nm 250
X-Y stage positioning accuracy, nm ±300
Aperture resolution, nm 500
Aperture rotation, degrees 0 ... 90
Power consumption, not more than, kW 3