PLANAR (KBTEM)
 
Our history

The history of the Planar holding dates back to November 1962, when the Design Bureau of Precision Electronic Engineering (KBTEM) was created in Minsk within the structure of the USSR Ministry of Electronic Industry with the main activity: development and organization of production of equipment for photolithographic processes and assembly operations in the production of ICs and other microelectronic products.

The first steps in the activities of the design bureau were aimed at forming a highly qualified team and developing an infrastructure that ensures the implementation of the life cycle of creating complex products, starting from scientific research, development of design documentation, production of prototypes and ending with their serial development, delivery and service of products at the buyer's.

In the first years of its activity, the equipment for the production of photomasks and for the operations of alignment and exposure on semiconductor wafers, equipment for the assembly of ICs and hybrid circuits using thermocompression, ultrasonic, electric pulse methods of connecting wire leads were developed and supplied to enterprises of the electronic industry.

In 1966, the first phototypesetter (pattern generator) was developed, and in 1967 - an automated flow line for assembling transistors on tape in plastic cases.

In 1971, "Planar" research and production association was formed, headed by KBTEM. It included large machine-building plants: "Ellar", Riga (Latvia); "Evistor", Vitebsk (Belarus); "Eton", Novolukoml and other enterprises located in Gorki and Novo-Rzhev.

In 1973, Planar developed the first EM-542 stepper, ahead of competitors from other countries. In 1977, the serial production of complete automatic wire bonders, model EM-490B, and probe automatic devices, model EM-680, using a 4-axis linear stepper drive, was started.

The rapid growth of the degree of integration of LSI, crystal sizes and the transition to wafers with a diameter of 5 ", 6" and 8 "required new developments. In 1981, a new basic model of the EM-584 stepper was developed and mass-produced, using a new multi-axis drive on the LSC, new projection lenses of the Binar series About 1000 steppers of various modifications of the base model have been manufactured over the years.

Further development was received in the direction of the development of pattern generators. The use of new radiation sources (lasers, flash lamps), high-speed computers, modular coordinate drives on LSD and high-resolution optics made it possible to create a family of high-performance pattern generators of the EM-559 models in 1978, EM-5009 (A) in 1981, and in 1984 a multi-ray laser generator EM-5089 was created. In 1988, the production of large-format pattern generators for kinescope masks and printed circuit board photomasks began.

In 1992, Planar started production of EM-5084 steppers on a new base platform designed to use 8" wafers with a minimum resolution of 0.5 microns.

New developments in assembly equipment were aimed at increasing the productivity and accuracy of operations performed, full automation of the work cycle, and the creation of complex automatic lines. Created in 1981-2002 models of automatic die bonders EM-4085, wire bonders EM-4060 (Au) and EM-4020B (A1) were based on multi-axis modular LSD, technical vision system and high-speed microprocessors. They solved the problem of a sharp increase in IP production. More than 5 thousand pieces of these models were produced in the 80s. The logical development of these models was the development in 1995 of new basic models of equipment for wire bonding EM-4260 (8 jumpers per second, Au) and EM-4280 (3 jumpers Al per second).


In recent years, specialists of the Planar holding company have created new models of equipment for submicron industrial products of microelectronics: multichannel laser pattern generators EM-5189, EM-5189-1, EM-5289, EM-5396; devices for automatic control of photomasks EM-6029B, EM-6329, EM-6729; laser-based mask defect repair systems EM-5001B, EM-5131; wide-format stepper EM-5434M; probers EM-6520, EM-6190A, EM-6290; wafer grinders EM-2060, EM-2070, EM-2080; wafer dicing saws EM-2085V, EM-2115 EM-225M; die bonders EM-4485, EM-4585; FlipChip die bonders ЭМ-4336; equipment for connecting terminals EM-4370, EM-4320 (-1,2,3,4), EM-4320U, EM-4020PM, EM-4340A1; microcontrol stations MK-1, MK-3, MK-AM.

At present, the Planar holding company is carrying out large-scale developments to create equipment for the production of microsystem engineering products, light-emitting diodes, equipment for research using photoacoustic and atomic force microscopy, equipment for manipulating objects in the nanometer range.

A range of microscopes, sets of logistics equipment, medical equipment will complement the scientific and technical potential of the holding company.

By order of the Minsk City Territorial Fund of State Property dated December 27, 2013 No. 164, by transforming the state scientific and production association of precision engineering "Planar", an open joint-stock company "Planar" (JSC "Planar") was created, which performs the functions of the management company of the research and production holding precision engineering "Planar", registered by the Ministry of Economy of the Republic of Belarus on September 24, 2014 in the register of holdings of the Republic of Belarus.

By the order of the Ministry of Industry of the Republic of Belarus dated October 18, 2019. No. 362 according to the optimization of the structure of the scientific and production holding of precision engineering "Planar", the open joint-stock company "Planar" was reorganized by joining the open joint-stock company "KBTEM-OMO".


HISTORY MILESTONES

2020: Reorganization of the open joint stock company "Planar" by joining the open joint stock company "KBTEM-OMO".

2014: Scientific and Production Republican Unitary Enterprise "KBTEM-OMO" (UE "KBTEM-OMO") was transformed into an open joint-stock company "KBTEM-OMO" (JSC "KBTEM-OMO").

2011: Creation of the device for automatic control of the topology EM-6729 for design standards 90 nm.

2009: Creation of the device laser-based mask defect repair systems EM-5131 under the design standards of 90 nm.

2008: Creation of EM-5289 pattern generator for 180 nm design standards.

2006: The device for automatic control of the topology of templates EM-6329B for design standards of 130 nm was created.

2000: State Prize of the Republic of Belarus in the field of technology for the work "Creation and development in the production of a complex of competitive precision equipment for the manufacture of high-precision originals of the topology of electronic products."
         Laureates: S.M. Avakov, V.E. Matyushkov, N.S. Kolyadko, A.A. Dyachenko, V.A. Yuditsky.

1997: Creation of a computer-aided design system for precision opto-mechanical devices "CAD" Mechanics ".

1991: Creation of KBTEM opto-mechanical equipment (UE "KBTEM-OMO") by order of the Ministry of Industry of the Republic of Belarus No. 82 dated 16.12.1991.
Development and release of new competitive equipment models (EM-5084, EM-5089A, etc.).
1989: Acting trademark:                                                                

1988: Participation in the international exhibition in Leipzig
         Automatic mask aligner EM-584A (Gold medal).

1987: Awarded the USSR State Prize in the field of science and technology for "Development and introduction into production of unified interactive software and hardware systems of the Kulon family."
         Laureates: V.P. Zuev and others.

1986: Awarded the USSR State Prize in the field of science and technology for "Development of technology, creation of automated equipment and introduction into the production of electronic devices for laser processing of film elements."
         Laureates: V.E. Matyushkov and others.

1978: Creation of a coordinate table using parts from gabbro-diabase. Head: G. D. Uskevich.
         Creation of complex lenses "Binar-13" and "Binar-23", a series of lenses "Fokar". Developers: E.S. Gurevich, G.V. Fokova, V.I. Tsuran, V.I. Shevlyukevich.

1977: Awarded the USSR State Prize in the field of science and technology for "Creation of a complex of automatic precision optical-mechanical equipment for microelectronics".
         Laureates: V.I. Malto, Ya.A. Raikhman, I.A. Kadomsky, V.A. Zaitsev, A.P. Svidelsky.

1975: The opto-mechanical scientific and technical department was created, which was headed by I.A. Kadomsky.

1973: The first Soviet aligner EM-542 was created.
         Developers: Ya.A. Raikhman, S.P. Andreev, A.B. Kanarsky, V.I. Kuzheleva, Ya. I. Fishbein, A.P. Svidelsky, R.E. Pyatetsky.

1972: Participation in the international exhibition in Leipzig
         Universal microphotosetting device EM-519 (Gold medal).
         Photorepeater EM-522 (Gold medal).

1971: Participation in the international exhibition in Leipzig
         Microphotosetting device EM-508 (Gold medal).

1969: The first set of photolithographic equipment:
         KP-1 - manual coordinator;
         EM-503 - cameras;
         EM-505 - one-place photo-repeater;
         USFM-2 - mask aligner.
         Developers - A.S. Karachun, A.N. Ritter, G.V. Korban, G. D. Uskevich, E.A. Kusman, V.A. Plavinsky, V.P. Kravtsov, V.I. Malto, Ya. I. Tochitsky, I.P. Hook.

         Participation in the international exhibition in Leipzig
         Raster photo camera EM-514 (Gold medal).

1966: The first EM-508 microphotosetter
         Developers: Ya.A. Raikhman, V.A. Kozlov, V.A. Zaitsev, Yu.N. Nazarov, Yu.E. Makarevich, R.I. Mironchik, V.A. Rudko, A.B. Canary.

1965: Two departments were formed:
         1. photolithographic equipment, head V.I. Malto
         2. promising developments, chief Ya.A. Raikhman

1964: UMM 1 - universal micromanipulator
         Developers: V.A. Kozlov, Ya.A. Raikhman, R.E. Pyatetsky, V.A. Zaitsev, A.P. Svidelsky
 
         The first author's certificate of the USSR "Micromanipulator"
          Authors: Ya.A. Raikhman, E.A. Kusman, G.P. Kuzmichev.
           
1964: The first trademark of the company is