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The photorepeater is intended for fabrication of
metalized master patterns and work photomasks in production of
semiconductor devices and integrated circuits by projection imaging.
The photorepeater operates in automatic mode and is
remotely controlled by the operator. Photorepeater operation is based on
sequential transfer of the reduced reticle pattern on the mask blank.
The Tool operates in sequence in the following automatic modes:
- mask blank loading from the feeding cassette to the coordinate stage carriage holder;
- mask blank holding on the work stage;
- transfer of reduced reticle pattern and automatic focusing on each module;
- mask unloading after exposure to the receiving cassette;
- library for reticle selection and change (10 pcs.).
SPECIFICATIONS
Throughput at 0.35 s exposure time and 10 х 10 mm die on
127 х 127 mm substrates (61 modules) | 35 photomasks/hour,
not less than | | Coordinate stage carriage travel area | (200 х 200) mm | | Coordinate stage carriage positioning accuracy along Х and Y | ±0.25 um, not more than | | Coordinate stage carriage positioning irreproducibility along X and Y | 0.2 um, not more than | | Objective lens reduction ratio | 1:5 | | Maximal photomask module size | (16 х 16) mm | Minimal feature size on module field:
(10 х 10) mm
(16 х 16) mm | 0.7 um
0.8 um | | Minimal feature size (line, space) irreproducibility | ±0.1 um, not more than | | Mask blank size | 5” x 5” (127 х 127) mm
6” x 6” (153 х 153) mm
7” x 7” (178 х 178) mm
| | Reticle size | 5” x 5” (127 х 127) mm | | Weight | 2900 kg
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Operation conditions
Optical unit: Class 100 clean room. Control unit: Class 10000 clean room. Power supply: 230 VAC, 50 Hz; power consumption: not more than 3kW; footprint 12 m2 (8 m2 in Class 100 room and 4 m2 in Class 10000 room).
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PLANAR (KBTEM)