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EM-5884 Wafer stepper distinctive features:
- Solid state laser as irradiation source;
- Reticle placed on coordinate stage which can move along Y with high accuracy relative to the substrate;
- Possible use of piezoelectric substrates for operation such as
lithium niobate, lithium tantalate, piezoquartz, langacite, langate,
etc.
| Reduction ratio | 1:5 | | Operating wavelength, nm | 354.7 | | Photolithographic resolution, um | 0.35 | | Work field size, mm | 3.2x3.2 | | Numerical aperture | 0.45-0.61 | | Wafer size, mm | 75,100,150 | | Reticle size, mm | 127x127 |
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PLANAR (KBTEM)