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EM-5784 Automatic alighment and exposure system

 

EM-5784 Automatic alighment and exposure system

EM-5784 distinctive features:

  • Solid state laser as irradiation source;
  • Reticle placed on coordinate stage which can move along Y with high accuracy relative to the substrate;
  • Possible use of piezoelectric substrates for operation such as lithium niobate, lithium tantalate, piezoquartz, langacite, langate, etc.

 

Specifications 

Reduction ratio 1:5
Operating wavelength, nm 354.7
Photolithographic resolution, um 0.35
Work field size, mm 3.2x3.2
Numerical aperture 0.45-0.61
Wafer size, mm 75,100,150
Reticle size, mm 127x127