«КБТЭМ-ОМО»
ОТКРЫТОЕ АКЦИОНЕРНОЕ ОБЩЕСТВО
 
EM-5141 LASER-BASED MASK DEFECT REPAIR SYSTEM

 

EM-5141 LASER-BASED MASK DEFECT REPAIR SYSTEM

EM-5141 mask repair system is intended for 65 nm node mask repair.

The repair system operation is based on two mask coating defect repair methods depending on defect types: elimination of opaque defects by mask coating evaporation using focused RYF-1/5FH laser irradiation in pulse mode; transparent defect are repaired by laser enhanced chemical vapor deposition (CVD). Defect area navigation is automatic and is based on the data from mask pattern inspection systems.

Main features:

  • transparent defect repair;
  • opaque defect repair;
  • TV monitoring over orientation, alignment and aiming;
  • possible semiautomatic mask loading/unloading.

 

Specifications

Minimal repairable defect size, um:  
- transparent defects 0.45
- opaque defects 0.15
Maximal workfield size, mm
160х160
Feature rotation,°
0 ... 90
Presetting increment of repairable opaque coating area, not more than, um
0.05
Power consumption, not more than, kW
4