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EM-5231 LARGE-FIELD LASER-BASED MASK DEFECT REPAIR SYSTEM |
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EM-5231 system is intended for repair of 5”, 6”,
7”, 9” masks with opaque and transparent defects: mouse bites,
protrusions, shorts between features, corner rounding etc.
The system enables repair of 2.2 mm to 6.45 mm masks with various coating types: chrome, chrome oxide, iron oxide.
Optical density and adhesive properties of repairable
transparent and opaque defects are in compliance with SEMI standards.
The system is in compliance with the interstate laser tool safety
standard IEC 60825-1-2013, technical regulations of the Customs Union
004/2011 (low voltage equipment safety).
The System has Certificates of Compliance with the following international standards and directives: SEMI S2-0818Ea, SEMI S8-0218, EN 60204-33:2011, 2006/42/EC Annex I, EN 60204-33:2011.
SPECIFICATIONS
| Isolated defect repair | Yes | | Edge defect repair | Yes | | Pellicle-through repair | Yes | | Use of defect files from inspection tools | Yes | | Patter copy repair | Yes | | Operation in transmitted light | Yes | | Operation in reflected light | Yes | | Illuminator wavelength | 258 nm | | Laser wavelength | 258 nm evaporation
488 nm deposition
| | Laser pulse time | <300 fs | | Objective lenses | 120x, 80x, 40x, 7.5x
| | Travel range along Z | 5 mm | | Repair part rotation for evaporation | +\- 45°
| | Mask load type | Semiautomatic | | Operational stability | ≥96% Uptime
| | Footprint | 15 m2 |
PERFORMANCE SPECIFICATION
| Objective lens magnification | 120x | 80x | 40x | | Objective lens working distance | 7.2 mm | 7.1 mm | 7.5 mm | | Maximum pellicle height | 6.3 mm | 6.3 mm | 6.3 mm | | XY stage minimum step size | 10 nm | 10 nm | 10 nm | | XY stage defect navigation accuracy | ±2 um | ±2 um | ±2 um | | Edge placement accuracy | ±50 nm | ±70 nm | ±100 nm | | Opaque defects: | Yes | Yes | Yes | | Minimum edge defect size | 150 nm | 250 nm | 500 nm | | Minimum isolated defect size | 150 nm | 250 nm | 500 nm | | Minimum trench width | 300 nm | 500 nm | 1000 nm |
| Transparent defect: | | 75x | |
| Transparent defect repair | N/A | Yes | N/A | | Minimum edge defect size | N/A | 400 nm* | N/A | | Minimum isolated defect size | N/A | 400 nm* | N/A | | Minimum trench width | N/A | 800 nm* | N/A |
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* Free space around the defect should be ≤ 0.5 um. Repair of transparent defects is performed by deposition with subsequent evaporation.
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PLANAR (KBTEM)
