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EM-6015M1 SYSTEM FOR ULTIMATE EXPRESS INSPECTION OF PELLICLE-COVERED MASKS

 

EM-6015M1 SYSTEM FOR ULTIMATE EXPRESS INSPECTION OF PELLICLE-COVERED MASKS

EM-6015M1 system is intended for dimension inspection and detection of mask and wafer pattern defects and contamination in microelectronic item fabrication process.

However, its application domain can be extended to materials science, mechanical engineering, metallography, criminalistics, restoration, production of new materials and research in universities and educational institutions.

Main features:
- telecentric optics;
- laser-based automatic focusing;
- pattern comparison function, software-based magnification adjustment, panoramic border-located pattern fragment butting etc.;
- calibration by measurement of certified dimensions on the test object;
- LED application to increase light source service life and reduce power consumption;
- vibration dampening.

 

 

Automated features:
- Horizontal and vertical sample travel.
- Objective lens changeover for magnification change.
- Light intensity adjustment.
- Focusing (dynamic laser focusing and static pattern-based focusing).
- Micro structure dimensions inspection.
- Inspected structure area navigation.
- Statistical inspection data processing.

 

Specifications 

Number of objective lenses, pcs. 3
Minimal objective lens flange focal distance, mm 10
Objective lens NA 0,15 ... 0,5
Objective lens magnification 5х ... 50х
Objective lens field of view, mm 0.44 ... 4,4
Display field of view (diagonal), mm 0,3 ... 3
Eyepieces magnification 10
Useful e-magnification 40
Overall magnification of eyepieces-assisted observation 50х ... 500х
Overall magnification of display-assisted observation up to 2000х
Video camera resolution, Mp 8
Display definition 4K
Coordinated stage travel for X, Y, and Z, mm 200х200х27
Overall dimensions, LхWхH, m 1,2х0,8х1,5
Power consumption from 230V mains, W, not more than 700
Weight, kg, not more than 175
Maximal power consumption, W, not more than 700