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EM-5489 MULTICHANNEL SOLID STATE LASER PATTERN GENERATOR

 

EM-5489 MULTICHANNEL SOLID STATE LASER PATTERN GENERATOR  

EM-5489 generator is intended for pattern generation on photomasks with 0.35 um resolution and wafers with 0.6 um resolution, i.e. maskless process.

Specifications

Laser spot size for half of maximal intensity, not more than, nm 200
Dimensions uniformity, nm 20
Alignment accuracy (3σ), nm 40
Exposure field size, mm 215х215
Exposure time of 100х100 mm area, min 30
Power consumption, kW 5